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Volumn 216, Issue 1-4 SPEC., 2003, Pages 287-290
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Depth profiling of oxynitride film formed on Si(1 0 0) by photon energy dependent photoelectron spectroscopy
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Author keywords
Depth profiling; Oxynitride; Photoelectron spectroscopy; Synchrotron radiation
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Indexed keywords
NITROGEN;
PHOTOELECTRON SPECTROSCOPY;
PHOTONS;
SILICA;
SILICON;
DEPTH PROFILING;
THIN FILMS;
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EID: 0037670113
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/S0169-4332(03)00389-1 Document Type: Conference Paper |
Times cited : (5)
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References (12)
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