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Volumn 216, Issue 1-4 SPEC., 2003, Pages 287-290

Depth profiling of oxynitride film formed on Si(1 0 0) by photon energy dependent photoelectron spectroscopy

Author keywords

Depth profiling; Oxynitride; Photoelectron spectroscopy; Synchrotron radiation

Indexed keywords

NITROGEN; PHOTOELECTRON SPECTROSCOPY; PHOTONS; SILICA; SILICON;

EID: 0037670113     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00389-1     Document Type: Conference Paper
Times cited : (5)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.