The effect of lattice strain on the step edge diffusion and morphological development during epitaxial growth

Materials Science Forum

Volumn 426-432, Issue 4, 2003, Pages 3463-3468

  Hong, Ki Ha ^a   Cha, Pil Ryung ^a   Yoon, Jong Kyu ^a  

^a Seoul National University   (South Korea)

Author keywords

Activation barrier; Embedded atom method; ES barrier; Island growth shape; Kinetic Monte Carlo; Strain

Indexed keywords

COMPUTER SIMULATION; DIFFUSION; MONOLAYERS; MONTE CARLO METHODS; MORPHOLOGY; STRAIN; THIN FILMS;

LATTICE STRAIN;

EPITAXIAL GROWTH;

EID: 0037662049     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.426-432.3463     Document Type: Conference Paper

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