Comparison of etching methods for sub-quarter micron rule mask fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3412, Issue , 1998, Pages 163-173

  Abe, Tsukasa ^a   Yokoyama, Toshifumi ^a   Kyoko, Sato ^a   Miyashita, Hiroyuki ^a   Hayashi, Naoya ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

CD control; Dry etching; Loading effect; Micro loading effect; Optical proximity correction

Indexed keywords

DRY ETCHING; PLASMA ETCHING; REACTIVE ION ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE;

CRITICAL DIMENSION UNIFORMITY; OPTICAL PROXIMITY PATTERNS;

MASKS;

EID: 0037660136     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.328797     Document Type: Conference Paper

References (1)

1. C. Constantine, D. J. Johnson, R. J. Westerman, T. Coleman, T. Faure and L. Dubuque "Plasma Etching of Cr Photomask: Optimization of Process Conditions and CD Control", Proc. of 17th Annual Symposium on photomask Technology and Management, pp.94-103,1997.