Real time spectroscopic reflectometer for end point detection on multichamber deposition processes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3507, Issue , 1998, Pages 208-215

  Boher, Pierre ^a   Noygues, Sebastien ^a   Sthele, Jean Louis ^a  

^a SOPRA   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; GATES (TRANSISTOR); OPTICAL FIBERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFLECTOMETERS; REGRESSION ANALYSIS; SUBSTRATES; THICKNESS MEASUREMENT;

END POINT DETECTION; MULTICHAMBER DEPOSITION; REAL TIME SPECTROSCOPIC REFLECTOMETER;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0037659343     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.324348     Document Type: Conference Paper

References (13)

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