Properties and production of F-doped silica glass

Journal of Fluorine Chemistry

Volumn 122, Issue 1, 2003, Pages 81-86

  Smith, Charlene M ^a   Moore, Lisa A ^a  

^a Corning Incorporated ^*  (United States)

Author keywords

Fluorine doping; Microlithography; Silica glass

Indexed keywords

FLUORINE DERIVATIVE; GLASS; SILICON DIOXIDE;

ARTICLE; CHEMICAL ANALYSIS; CONCENTRATION (PARAMETERS); CONTROLLED STUDY; INFRARED RADIATION; MEASUREMENT; PHOTOCHEMISTRY; PHYSICAL CHEMISTRY; REFRACTION INDEX; SPECTRAL SENSITIVITY; TEMPERATURE; ULTRAVIOLET RADIATION; VACUUM;

EID: 0037633532     PISSN: 00221139     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-1139(03)00097-6     Document Type: Article

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