Approach to optimize the pinning effect of a NiMn layer with reduced thickness under a much shortened annealing process

Applied Physics Letters

Volumn 82, Issue 21, 2003, Pages 3722-3724

  Dai, B ^a   Cai, J W ^a   Lai, W Y ^a   Shen, F ^a   Zhang, Z ^a   Yu, G H ^b  

^a INSTITUTE OF PHYSICS   (China)

^b UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ANTIFERROMAGNETISM; DIFFUSION; FERROMAGNETISM; STOICHIOMETRY;

PINNING EFFECT;

NICKEL COMPOUNDS;

EID: 0037631337     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1579118     Document Type: Article

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