Low thermal budget NiSi films on SiGe alloys

Materials Research Society Symposium - Proceedings

Volumn 745, Issue , 2002, Pages 247-252

  Ray, S K ^b   Adam, T N ^a   Kar, G S ^b   Swann, C P ^a   Kolodzey, J ^a  

^a UNIVERSITY OF DELAWARE   (United States)

^b INDIAN INSTITUTE OF TECHNOLOGY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; MICROSTRUCTURE; NICKEL ALLOYS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

FOUR-PROBE RESISTIVITY;

SILICON ALLOYS;

EID: 0037617748     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-745-n6.6     Document Type: Conference Paper

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