Boron nitride thin films synthesized by reactive sputtering

Vacuum

Volumn 59, Issue 2-3, 2000, Pages 748-754

  Hu, C ^a   Kotake, S ^a   Suzuki, Y ^a   Senoo, M ^a  

^a MIE UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0037606435     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(00)00343-2     Document Type: Article

References (9)

1. Aita CR. Mater Sci Forum 1990;54 and 55:1.
2. Wiggins MD, Aita CR, Hickernell FS. J Vac Sci Technol 1984;A 2:322.
3. Mieno M, Yoshida T. Jpn J Appl Phys 1990;29:L1175.
4. Gissler W, Haupt J, Crabb TA, Gibson PN, Rickerby DG. Mater Sci Eng 1991;A 139:284.
5. Jager S, Bewilogua K, Klages CP. Thin Solid Films 1994;245:50.
6. Otaño-Rivera W, Pilione LJ, Zapien JA, Messier R. J Vac Sci Technol 1998;A 16(3):1331.
7. Jensen H, Jensen UM, Sorensen G. Appl Phys Lett 1995;66:1489.
8. Jankowski AF, Hayes JP, Makowiecki DM, McKernan MA. Thin Solid Films 1997;308-9:94.
9. Wakatsuchi M, Takaba Y, Ueda Y, Nishikawa M. Jpn J Appl Phys 1998;37:L1082.