Fractal growth of silicon-rich domains during annealing of aluminum thin films deposited on silica

Physical Review E - Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics

Volumn 54, Issue 1, 1996, Pages 599-604

  Balazs, Laszlo ^a,b,c   Fleury, Vincent ^a,b,c   Duclos, Franck ^a,b,c   Van Herpen, A ^a,b,c  

^a GE Lighting Hungary   (Hungary)

^b LABORATOIRE DE PHYSIQUE DE LA MATIÈRE CONDENSÉE   (France)

^c ENSTA PARISTECH   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0037566903     PISSN: 1063651X     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevE.54.599     Document Type: Article

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