IR confocal laser microscopy for MEMS technological evaluation

Microelectronics Reliability

Volumn 42, Issue 9-11, 2002, Pages 1815-1817

  Lellouchi, D ^a   Beaudoin, F ^a   Le Touze, C ^a   Perdu, P ^a   Desplats, R ^a  

^a CNES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

NONDESTRUCTIVE EXAMINATION; PROCESS CONTROL; PROCESS MONITORING; SILICON OXIDES;

CONFOCAL LASER MICROSCOPY; ETCHING RATE; INLINE PROCESS MONITORING; ITS APPLICATIONS; MICRO ELECTRO MECHANICAL SYSTEM; NONDESTRUCTIVE CHARACTERIZATION; SILICON STRUCTURES;

MEMS;

EID: 0037555857     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(02)00237-8     Document Type: Conference Paper

References (2)

1. M. Madou, Fundamentals of microfabrication, CRC-Press, 1997.
2. T.W. Joseph, A.L. Berry and B. Bossmann, Infrared Laser Microscopy of Structures on Heavily Doped Silicon, ISTFA, 1-7, 1992.