High-density plasma production for neutralizing negative ion beam

Review of Scientific Instruments

Volumn 69, Issue 2, 1998, Pages 980-982

  Tanaka, M Y ^a   Bacal, M ^a   Sasao, M ^a   Kuroda, T ^a  

^a NATIONAL INSTITUTE FOR FUSION SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0037531113     PISSN: 00346748     EISSN: 10897623     Source Type: Journal    
DOI: 10.1063/1.1148607     Document Type: Conference Paper

References (8)

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3. A. I. Hershcovitch et al., Rev. Sci. Instrum. RSINAK 55, 1744 (1984).
4. K. G. Moses and J. R. Trow, Proceedings of III European Workshop on Production and Application of Light Negative Ions, Amersfoot, The Netherlands, 1988.
5. M. Tanaka et al., J. Phys. Soc. Jpn. JUPSAU 60, 1600 (1991).
6. M. Tanaka et al., Jpn. J. Appl. Phys., Part 1 JAPNDE 33, 5028 (1994).
7. A. I. Livshits, Vacuum VACUAV 29, 103 (1979).
8. M. Bacal et al., Fusion Technology 1996 (Elsevier, Amsterdam, 1997), 1157.