Plasmachemical oxidation processes - Part 2: Equipment;Plasmachemische oxidationsverfahren - Teil 2: Apparative voraussetzungen

Galvanotechnik

Volumn 94, Issue 6, 2003, Pages 1374-1382+v

  Kreisel, Von Günter ^a   Meyer, Susann ^a   Gorges, Roger ^a   Käßbohrer, Johannes ^c   Bayer, Ullrich ^b  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^b BIOMATERIALS DEPARTMENT   (Germany)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SOFTWARE; ELECTRIC CURRENTS; ELECTRIC POWER SUPPLIES TO APPARATUS; OXIDATION;

SPARK DISCHARGE;

PLASMA APPLICATIONS;

EID: 0037526890     PISSN: 00164232     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

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