High-density plasma etching of iridium thin films in a Cl2/O2/Ar plasma

Journal of the Electrochemical Society

Volumn 150, Issue 5, 2003, Pages

  Chung, Chee Won ^a   Kim, Hye In ^a   Song, Young Soo ^a  

^a Inha University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHLORINE; DRY ETCHING; ELECTRIC COILS; ELECTRIC POTENTIAL; INDUCTIVELY COUPLED PLASMA; IRIDIUM; MAGNETRON SPUTTERING; MASKS; OXYGEN; PLASMA ETCHING; TITANIUM NITRIDE;

DC MAGNETRON SPUTTERING; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; HIGH DENSITY PLASMA ETCHING; IRIDIUM FIKMS;

THIN FILMS;

EID: 0037502846     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1562935     Document Type: Article

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