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Volumn 45, Issue 3-4, 2003, Pages 67-70

Photopolymerization of methyl methacrylate in the presence of polyimide

Author keywords

[No Author keywords available]

Indexed keywords

METHACRYLIC ACID METHYL ESTER; POLYIMIDE; RADICAL;

EID: 0037487271     PISSN: 15600904     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (7)

References (17)
  • 2
    • 0004093537 scopus 로고
    • Introduction to microlithography. Theory, materials and processes
    • Washington: Amer. Chem. Soc.
    • Introduction to Microlithography. Theory, Materials and Processes, ACS Symposium Series, vol. 219, Thompson, L.F., Wilson, C.G., and Bowden, M.J., Eds., Washington: Amer. Chem. Soc., 1983.
    • (1983) ACS Symposium Series , vol.219
    • Thompson, L.F.1    Wilson, C.G.2    Bowden, M.J.3
  • 17
    • 0003852804 scopus 로고
    • Krongauz, V.V. and Trifunac, A.D., Eds., New York: Chapman and Hall
    • Decker, C., Processes in Photoreactive Polymers, Krongauz, V.V. and Trifunac, A.D., Eds., New York: Chapman and Hall, 1995, p. 34.
    • (1995) Processes in Photoreactive Polymers , pp. 34
    • Decker, C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.