The initial stages of Si thin deposits on foreign substrates in a rapid thermal chemical vapor phase reactor

Materials Science in Semiconductor Processing

Volumn 1, Issue 3-4, 1998, Pages 293-297

  Angermeier, D ^a   Monna, R ^a   Bourdais, S ^a   Slaoui, A ^a  

^a Faculté de Médecine   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0037479964     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(98)00035-3     Document Type: Article

References (17)

1. Green ML, Brasen D, Luftman H, Kannan VC. J Appl Phys 1989;65:2558.
2. Vook DW, Gibbons JF. J Appl Phys 1990;67:2100.
3. Faller FR, Schillinger N, Hurrle A, Schetter C. 14th EPVSEC. Barcelona, 1997. p. 784.
4. Green MA. Silicon solar cells. In: Advanced principles and practice. Sydney: UNSW, 1995.
5. Bloem J. J Cryst Growth 1980;50:581.
6. Hirth JP. J Cryst Growth 1972;17:63.
7. Venables JA. J Vac Sci Techol B 1986;4:870.
8. Zinke-Allmang M, Feldman LC, Grabow MH. Surf Sci Rep 1992;16:377.
9. Angermeier D, Monna R, Slaoui A, Muller JC. J Electrochem Soc 1997;144:3256.
10. Claasen WAP, Bloem J. J Electrochem Soc 1980;127:194.
11. Venables JA. Surf Sci 1994;299-300:798.
12. Jensen KF. In: Hurle DTJ, editor. Handbook of crystal growth 3, Thin films and epitaxy, Part B. Elsevier Science Publisher, 1994. ch. 13.
13. Claasen WAP, Bloem J. J Electrochem Soc 1980;127:1836.
14. Stowell MJ. J Cryst Growth 1974;24-25:42.
15. Cullen GW. J Cryst Growth 1971;9:107.
16. Bloem J, Gilling LJ. In: Kladis E, editor. Current topics in materials science, vol. 1. North-Holland Publishing Co., 1978.
17. Mercier J. J Electrochem Soc 1970;117:813.