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Chemical Vapor Deposition

Volumn 7, Issue 1, 2001, Pages 7-18

Atomic layer-by-layer MOCVD of complex metal oxides and in situ process monitoring

(2) Yamamoto, Shuu'ichirou a Oda, Shunri a

a TOKYO INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

Atomic layer by layer MOCVD; In situ growth monitoring; Oxide superconductors, precursor concentration monitoring; Spectroscopic ellipsometry

Indexed keywords

EID: 0037479200 PISSN: 09481907 EISSN: None Source Type: Journal
DOI: 10.1002/1521-3862(200101)7:1<7::AID-CVDE7>3.0.CO;2-L Document Type: Review

Times cited : (17)

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