ABA triblock copolymers containing polyhedral oligomeric silsesquioxane pendant groups: Synthesis and unique properties

Polymer

Volumn 44, Issue 9, 2003, Pages 2739-2750

  Pyun, Jeffrey ^a,c   Matyjaszewski, Krzysztof ^a   Wu, Jian ^b   Kim, Gyeong Man ^b   Chun, Seung B ^b,d   Mather, Patrick T ^b  

^a CARNEGIE MELLON UNIVERSITY   (United States)

^b UNIVERSITY OF CONNECTICUT   (United States)

^c IBM   (United States)

^d Rogers Corp   (United States)

Author keywords

Block copolymers; Polyhedral oligomeric silsesquioxane; POSS

Indexed keywords

GLASS TRANSITION; MICROSTRUCTURE; PHASE SEPARATION; POLYMERIZATION; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL); X RAY SCATTERING;

MOLAR RATIO;

BLOCK COPOLYMERS;

ALKANE DERIVATIVE; COPOLYMER; METHACRYLIC ACID DERIVATIVE; POLY[3 (3,5,7,9,11,13,15 HEPTAISOBUTYLPENTACYCLO[9.5.1 3,9 .1 5,15 .1 7,13 ]OCTASILOXAN 1 YL)PROPYL]METHACRYLATE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL COMPOSITION; FILM; MOLECULAR WEIGHT; PHASE SEPARATION; POLYMERIZATION; RADIATION SCATTERING; STAINING; SYNTHESIS; TEMPERATURE; THERMAL ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY;

POLYMER;

EID: 0037474750     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0032-3861(03)00027-2     Document Type: Article

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