Study on the optoelectronic properties of amorphous selenium-based xerographic photoreceptors for electrophotography

Materials Chemistry and Physics

Volumn 78, Issue 3, 2003, Pages 666-669

  Chou, Jung Chuan ^a   Yang, Shu Ying ^a   Wang, Yen Sheng ^a  

^a NATIONAL YUNLIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Initial surface potential; Isothermal annealing; Photoinduced discharge curve; Photosensitivity; Residual potential

Indexed keywords

ALUMINUM COMPOUNDS; ANNEALING; DEPOSITION; EVAPORATION; OPTOELECTRONIC DEVICES; OXIDATION; PHOTOSENSITIVITY; SELENIUM; SPUTTERING; TUNGSTEN COMPOUNDS;

ELECTROPHOTOGRAPHY;

AMORPHOUS MATERIALS;

EID: 0037469513     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(02)00304-8     Document Type: Article

References (18)

1. Taniguchi Y., Yamamoto H., Horigome S., Saito S., Maruyama E. J. Appl. Phys. 52:1981;7261.
2. R.M. Schaffert, Electrophotography, Halsted Press, New York, 1975.
3. E.M. Williams, The Physics and Technology of Xerographic Processes, Interscience, New York, 1984.
4. J. Mort, I. Chen, Physics of Xerographic Photoreceptors, Academic Press, New York, 1975.
5. J. Mort, D. Pai, Amorphous Molecular Solids, CRC Press, Boca Raton, FL, 1985.
6. Oda S., Saito Y., Shimizu I., Inoue E. Phil. Mag. B. 43:1981;1079.
7. Van Swaaij R.A.C.M.M., Willems W.P.M., Lokker J.P., Bezemer J., van der Weg W.F. J. Appl. Phys. 77:1995;1635.
8. Zhang Q., Champness C.H. Can. J. Phys. 69:1991;278.
9. W. Hillen, U. Schiebel, T. Zaengel, in: Proceedings of the International Conference SPIE, Vol. 914, Bellingham Inc., Washington, America, 1988, p. 253.
10. Kasap S.O., Aiyah V., Polischuk B., Liang Z., Bekirov A. J. Non-Cryst. Solids. 137/138:1991;1329.
11. M.E. Scharfe, Electrophotography Principles and Optimization, Wiley, New York, 1984.
12. Schiebel U., Buchkremer T., Frings G., Quadflieg P. J. Non-Cryst. Solids. 115:1989;216.
13. Witte H., Herams W. Phys. Stat. Sol. (A). 132:1992;K71.
14. Meng S.P., Chou J.C., Chung W.Y., Sun T.P., Hsiung S.K. Chin. J. Mater. Sci. 28:1996;82.
15. Liao S.F., Chou J.C., Chung W.Y., Sun T.P., Hsiung S.K. Chin. J. Mater. Sci. 27:1995;318.
16. Matsumoto S., Du B., Masui M., Oguchi K., Takeuchi M. Jpn. J. Appl. Phys. 32:1993;L1236.
17. J.T. Bickmore, Xerography and Related Processes, Focal Inc., London, UK, 1965.
18. Kamalasanan M.N., Chand S. Appl. Phys. Lett. 56:1990;330.