Autocatalytic reaction model: A phenomenology for nucleation-coalescence-growth of thin films

Thin Solid Films

Volumn 428, Issue 1-2, 2003, Pages 83-86

  Suemitsu, Maki ^a   Togashi, Hideaki ^b   Abe, Toshimi ^b  

^a TOHOKU UNIVERSITY   (Japan)

^b TOHOKU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Autocatalytic reaction; Coalescence of islands; Island growth; Si oxidation; Thin film growth

Indexed keywords

ADSORPTION; COALESCENCE; EPITAXIAL GROWTH; NUCLEATION; OXIDATION; REACTION KINETICS;

AUTOCATALYTIC REACTIONS (ACR);

THIN FILMS;

EID: 0037457150     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01271-3     Document Type: Conference Paper

References (6)

1. Watanabe H., Kato K., Uda T., Fujita K., Ichikawa M. Phys. Rev. Lett. 80:1998;345.
2. Suemitsu M., Enta Y., Miyanishi Y., Miyamoto N. Phys. Rev. Lett. 82:1999;2334.
3. Atkins P.W. Physical Chemistry. 4th ed: 1990;Oxford University Press, New York.
4. Mukesh D., Morton W., Kenney C.N., Cutlip M.B. Surf. Sci. 138:1984;237.
5. R. Vincent, Proceedings of the Royal Society of London. A321 (1971) pp. 53.
6. Gilmer G.H., Bennema P. J. Appl. Phys. 43:1972;1347.