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Volumn 241, Issue 1-2, 2003, Pages 65-75

Behaviour of palladium and ruthenium catalysts on alumina and silica prepared by gas and liquid phase deposition in cinnamaldehyde hydrogenation

Author keywords

ALE; Atomic layer epitaxy; Cinnamaldehyde; Cinnamyl alcohol; Hydroc innamaldehyde; Hydrogenation; Impregnation; Palladium; Ruthenium

Indexed keywords

ALCOHOLS; ALUMINA; CATALYST ACTIVITY; DEPOSITION; HYDROGENATION; IMPREGNATION; PALLADIUM; RUTHENIUM; SILICA;

EID: 0037456209     PISSN: 0926860X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0926-860X(02)00423-4     Document Type: Article
Times cited : (92)

References (32)
  • 5
    • 0013288892 scopus 로고    scopus 로고
    • WO Patent Application WO 99/08989, First Chemical Corporation, 1999
    • A. Muller, J. Bowers, WO Patent Application WO 99/08989, First Chemical Corporation, 1999.
    • Muller, A.1    Bowers, J.2
  • 6
    • 0013236599 scopus 로고    scopus 로고
    • US Patent 3 372 199, Engelhard Industries Inc., 1968
    • P. Rylander, N. Himselstein, US Patent 3 372 199, Engelhard Industries Inc., 1968.
    • Rylander, P.1    Himselstein, N.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.