Electrostatic response of hydrophobic surface measured by atomic force microscopy

Applied Physics Letters

Volumn 82, Issue 7, 2003, Pages 1126-1128

  Teschke, O ^a   De Souza, E F ^b  

^a UNIVERSITY OF CAMPINAS   (Brazil)

^b PONTIFÍCIA UNIVERSIDADE CATÓLICA DE CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTROSTATICS; HYDROPHOBICITY; INTERFACES (MATERIALS); MONOLAYERS; PERMITTIVITY; SILICON; SOLUTIONS;

HYDROPHOBIC SURFACES;

SURFACE CHEMISTRY;

EID: 0037450232     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1542945     Document Type: Article

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