Structure of PECVD Si:H films for solar cell applications

Solar Energy Materials and Solar Cells

Volumn 77, Issue 2, 2003, Pages 125-143

  Edelman, F ^a   Chack, A ^a   Weil, R ^a   Beserman, R ^a   Khait, Yu L ^a   Werner, P ^b   Rech, B ^c   Roschek, T ^c   Carius, R ^c   Wagner, H ^c   Beyer, W ^c  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^c FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Microcrystalline; Silicon; Stability; Structure

Indexed keywords

AMORPHOUS SILICON; CRYSTAL STRUCTURE; HYDROGENATION; LIGHT ABSORPTION; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

HYDROGEN EFFUSION;

SILICON SOLAR CELLS;

EID: 0037448125     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(02)00274-X     Document Type: Article

References (42)

1. Keppner H., Meier J., Torres P., Fischer D., Shah A. Appl. Phys. A. 69:1999;169
2. K. Saito, M. Sano, K. Matsuda, T. Kondo, T. Nishimoto, K. Ogawa, I. Kajito, Proceedings of the Second World Conference and Exhibition on Photovoltaic Energy, Vienna, Austria, 1998, pp. 351-355.
3. Yamamoto K., Yoshimi M., Towada Y., Okumoto Y., Nakajima A. J. Non-Cryst. Solids. 266-269:2000;1082-1088.
4. O. Vetterl, R. Carius, L. Houben, C. Scholten, M. Luysberg, A. Lambertz, F. Finger, H. Wagner, Proceedings of the MRS Spring Meeting, San Francisco, Vol. 605, 2000, p. A15.2.
5. Y. Nasuno, M. Kondo, A. Matsuda, Proceedings IEEE Photovoltaics Specialists Conference, Anchorage, Alaska, 2000, pp. 344-351.
6. Chatham H., Bhat P., Benson A., Matovich C. J. Non-Cryst. Solids. 115:1989;201-206.
7. Guo L., Kondo M., Fukawa M., Saitoh K., Matsuda A. Jpn. J. Appl. Phys. 37:1998;L1116-L1118.
8. Rech B., Roschek T., Müller J., Wieder S., Wagner H. Sol. Energy Mater. Sol. Cells. 62:2000;211-219
9. T. Roschek, T. Repmann, J. Mueller, B. Rech, H. Wagner, Proceedings of the IEEE Photovoltaic Specialists Conference, Anchorage, Alaska, 2000, pp. 377-382.
10. Edelmann F. Struktur von Festkörpern der Mikroelectronik. 1985;Akademie-Verlag, Berlin.
11. Kamins T. Polycrystalline Silicon for Integrated Circuit Applications. 1988;Kluwer, Boston.
12. Staebler D.L., Wronski C.R. Appl. Phys. Lett. 31:1977;292-294.
13. He Y., Yin C., Cheng G., Wang L., Liu X., Hu G.Y. J. Appl. Phys. 75:1994;797-805.
14. Houben L., Luysberg M., Hapke P., Carius R., Finger F., Wagner H. Philos. Mag. A77:1998;1447-1455.
15. Ross Ch., Herion J., Carius R., Wagner H. Mater. Sci. Eng. B. 72:2000;1-11.
16. Tzolov M., Finger F., Carius R., Hapke P. J. Appl. Phys. 81:1997;7376-7388.
17. Collins R., Yang B. J. Vac. Sci. Technol. B. 7:1989;155-162.
18. Wyrsch N., Torres P., Goerlitzer M., Vallat E., Kroll U., Shah A., Poruba A., Vanecek M. Solid State Phenomena. 67-68:1999;89-101.
19. Beyer W., Herion J., Wagner H., Zastrow U. Philos. Mag. B. 63:1991;269-281.
20. Beyer W., Hapke P., Zastrow U. Mater. Res. Sci. Symp. Proc. 467:1997;343-349.
21. O. Kluth, A. Loeffl, S. Wieder, C. Beneking, W. Appenzeller, L. Houben, B. Rech, H. Wagner, S. Hoffmann, R. Waser, J.A. Anna Selvan, H. Keppner, Proceedings of the 26th IEEE Photovoltaic Specialists Conference, Annaheim, USA, 1997, pp.715-721.
22. T. Roschek, J. Müller, S. Wieder, B. Rech, H. Wagner, Proceedings of the 16th European Photovoltaic Solar Energy Conference, Glasgow, UK, 2000, pp. 561-565.
23. Ossadnik Ch., Veprek S., Gregora I. Thin Solid Films. 337:1999;148-156.
24. Ch M.H.Brodsky, in: M. Cardona (ed.), Light Scattering in Solids (Topics in Applied Physics), Vol. 8, Springer, Berlin, 1975.
25. H.P. Klug, L.E. Alexander, XRD Diffraction Procedures, Wiley, New York, 1954, p. 491.
26. Tsai C.C., Thompson R., Doland C., Ponce F.A., Anderson G.B., Wacker B. Mater. Res. Soc. Symp. Proc. 118:1988;49-53.
27. Jackson W.B., Amer N.N., Boccara A.C., Fournier D. Appl. Opt. 20:1981;1333-1338.
28. Achiq A., Rizk R., Madelon R., Gourbilleau F., Voivenel P. Philos. Mag. B79:1999;777-785.
29. Christian J.W. The Theory of Transformation in Metals and Alloys. 1975;Pergamon Press, Oxford.
30. Edelman F., Cytermann C., Brener R., Eizenberg M., Khait Yu., Weil R., Beyer W. J. Appl. Phys. 75:1994;7875-7883.
31. Edelman F., Brener R., Cytermann C., Weil R., Beneking C., Beyer W. MRS Symp. Proc. 420/424:1996;849-855.
32. Khait Yu.L., Weil R. J. Appl. Phys. 78:1995;6504-6511.
33. Khait Yu.L., Beserman R. Phys. Rev. B. 33:1986;2983-2990.
34. Yu.L. Khait, Kinetics and Application of Atomic Diffusion in Solids: Nanoscopic Electron-Affected Stochastic Dynamics, SCITEC Pub., Switzerland, 1997.
35. Olson G.L., Roth J.A. Mater. Sci. Rep. 3:1988;1-78.
36. Spirella C., Lombardo S. J. App. Phys. 84:1998;5383-5892.
37. Yu.L. Khait, in: J.J. Puch, S.A. Alterovitz (eds.), Plasma Properties, Deposition and Etching, Trans Tech Pub., Switzerland, 1998.
38. Khait Yu.L., Weil R., Beserman R., Edelman F., Beyer W., Rech B. Ann. Israel Phys. Soc. 14:2001;72-77.
39. D.C. Allen, J.D. Joannopoulos, in: J.D. Joannopoulos, G. Lucovsky (eds.), Physics of Hydrogenated Amorphous Silicon, Springer, Berlin, 1984.
40. Hsun Hu (ed.). Nature and Behaviour of Grain Boundaries, Plenum, New York, 1974.
41. J.J. Burke, W. Weiss (eds.), Ultrafine-Grain Metals, Syracuse University Press, Syracuse, 1970.
42. Bailat J., Vallat-Sauvain E., Feitknecht L., Droz C., Shah A. J. Non-Cryst. Solids. 299-302(P2):2002;1219-1223.