Determination of trace iron in indium phosphide wafer by on-line matrix separation and inductively coupled plasma mass spectrometry

Analytica Chimica Acta

Volumn 482, Issue 2, 2003, Pages 189-196

  Kozono, Shuji ^a   Haraguchi, Hiroki ^b  

^a High Performance Materials Department   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

Indium phosphide wafer; Inductively coupled plasma mass spectrometry; Internal standardization; On line matrix separation; Trace iron

Indexed keywords

ABSORPTION; ABSORPTION SPECTROSCOPY; DOPING (ADDITIVES); HYDROCHLORIC ACID; ION EXCHANGE; MASS SPECTROMETRY; SEMICONDUCTING INDIUM PHOSPHIDE;

CARRIER SOLUTIONS;

IRON;

ANION EXCHANGE RESIN; CHLORIDE; COBALT; INDIUM; IRON; TRACE ELEMENT;

ADSORPTION; ALKALINITY; ANION EXCHANGE; ARTICLE; ASSAY; ATOMIC ABSORPTION SPECTROMETRY; CHEMOSENSITIVITY; COMMERCIAL PHENOMENA; ELUTION; FLOW; INDIUM PHOSPHIDE WAFER; ION EXCHANGE; MASS SPECTROMETRY; MEASUREMENT; NEBULIZER; PLASMA; PRIORITY JOURNAL; QUANTITATIVE ANALYSIS; SAMPLE; SEMICONDUCTOR; SEPARATION TECHNIQUE; STANDARD; TECHNIQUE; TIME;

EID: 0037446480     PISSN: 00032670     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0003-2670(03)00255-1     Document Type: Article

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