Diffractive optical elements written by photodeposition

Applied Surface Science

Volumn 208-209, Issue 1, 2003, Pages 226-232

  Baal Zedaka, I ^a   Hava, S ^b   Mirchin, N ^a   Margolin, R ^a   Zagon, M ^a   Lapsker, I ^a   Azoulay, J ^a   Peled, A ^a  

^a HOLON INSTITUTE OF TECHNOLOGY   (Israel)

^b BEN GURION UNIVERSITY OF THE NEGEV   (Israel)

Author keywords

Diffractive optical elements; Optical gratings; Optical microelements; Photodeposition

Indexed keywords

COALESCENCE; COMPUTER CONTROL SYSTEMS; ETCHING; HYDROGELS; LASER BEAMS; MICROLENSES; POLYMETHYL METHACRYLATES; SELENIUM; THIN FILMS; AMORPHOUS MATERIALS; ARGON; ELECTRODEPOSITION; LASER ABLATION; MICROSTRUCTURE; PHOTOLITHOGRAPHY;

LASER WRITING; PHOTODEPOSITION; DIFFRACTIVE OPTICAL ELEMENTS (DOE); PHOTODEPOSITION (PD);

DIFFRACTION GRATINGS; DIFFRACTIVE OPTICS;

EID: 0037443212     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)01385-5     Document Type: Conference Paper

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