Parallax measurements of integrated circuit interconnects using a scanning transmission electron microscope

Journal of Applied Physics

Volumn 93, Issue 4, 2003, Pages 2193-2197

  Levine, Zachary H ^a   Gao, James J ^b   Neogi, Suneeta ^c   Levin, T M ^d   Scott, John Henry ^a   Grantham, Steven ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b Montgomery Blair High School   (United States)

^c INTEL CORPORATION   (United States)

^d IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE ATTENUATION; ION BEAMS; MATHEMATICAL MODELS; MATRIX ALGEBRA; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

INTEGRATED CIRCUIT INTERCONNECTS;

INTEGRATED CIRCUITS;

EID: 0037442452     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1538336     Document Type: Article

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