Kinetics of DyNi2 film growth by electrochemical implantation

Electrochimica Acta

Volumn 48, Issue 5, 2003, Pages 563-568

  Konishi, H ^a   Nohira, T ^a   Ito, Y ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Coulomb efficiency; DyNi2 film; Electrochemical implantation; Growth rate; LiCl KCl

Indexed keywords

ELECTRIC POTENTIAL; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMISTRY; FILM GROWTH; MOLTEN MATERIALS; NICKEL; REACTION KINETICS; THIN FILMS;

ELECTROCHEMICAL IMPLANTATION;

DYSPROSIUM COMPOUNDS;

EID: 0037438956     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0013-4686(02)00723-5     Document Type: Article

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