Asymmetric transport due to spin injection into a kondo alloy

Physical Review Letters

Volumn 90, Issue 1, 2003, Pages

  Taniyama, T ^a,b   Fujiwara, N ^a   Kitamoto, Y ^a   Yamazaki, Y ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT; CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CONDUCTIVITY MEASUREMENT; ELECTRIC CURRENT DISTRIBUTION; ELECTRIC WIRE; ELECTRON BEAM LITHOGRAPHY; ELECTRON TRANSPORT PROPERTIES; INTERFACES (MATERIALS); MAGNETIZATION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON;

ASSYMETRIC TRANSPORT; KONDO ALLOY; LIFT OFF TECHNIQUE; SPIN INJECTION; SPIN POLARIZED ELECTRON CURRENT FLOW;

COPPER ALLOYS;

EID: 0037428596     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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