Discharge cleaning of aluminum components

Vacuum

Volumn 71, Issue 1-2 SPEC., 2003, Pages 233-236

  Mozetič, Miran ^a   Zalar, Anton ^a  

^a Institute of Surface Engineering and Optoelectronics Ljubljana   (Slovenia)

Author keywords

Aluminum; Discharge cleaning; Oxygen plasma; Polymer

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; OXYGEN; PLASMA DENSITY; THIN FILMS;

DISCHARGE CLEANING;

ALUMINUM;

EID: 0037427397     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00743-1     Document Type: Conference Paper

References (11)

1. Boeing H. Plasma science and technology. 1982;Cornell University Press, London.
2. Wertheimer M.R., Martinu L., Piston E.M. Plasma sources for polymer surface treatment. Glocker D.A., Shah S.I. Handbook of thin film process technology. 1998;Institute of Physics Publishing, Bristol.
3. Ricard A. Reactive plasmas. 1996;Societe Francaise du Vide, Paris.
4. Mozetič M. Vacuum. 61:2001;376.
5. Šorli I., Pettasch W., Kegel B., Schmidt H., Liebel G. Inform Midem. 26:1996;35.
6. Schmeling M., Klockow D. Anal Chim Acta. 30:1997;121.
7. Ricard A., Gaillard M., Monna V., Vesel A., Mozetič M. Surf Coat Technol. 142:2001;333.
8. Babič D., Poberaj I., Mozetič M. Rev Sci Instrum. 72:2001;4110.
9. Mozetič M., Vesel A., Guillard M., Ricard A. Plasmas Polym. 6:2001;41.
10. Poberaj I., Babič D., Mozetič M. J Vac Sci Technol. A20:2001;189.
11. Mozetič M., Zalar A., Panjan P., Bele M., Pejovnik S., Grmek R. Thin Solid Films. 376:1999;5.