Alkylation of toluene with isopropyl alcohol over chemical liquid deposition modified HZSM-5 under atmospheric and supercritical operations

Industrial and Engineering Chemistry Research

Volumn 42, Issue 7, 2003, Pages 1334-1340

  Chiang, Tai Chen ^a   Chan, Jui Chi ^a   Tan, Chung Sung ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALKYLATION; ATMOSPHERIC PRESSURE; CARBON DIOXIDE; CATALYSTS;

CHEMICAL LIQUID DEPOSITION TECHNIQUES;

TOLUENE;

2 PROPANOL; CARBON DIOXIDE; CHLORINE DERIVATIVE; PARA CYMENE; SILICON DERIVATIVE; TOLUENE; WATER; ZEOLITE;

TOLUENE;

ALKYLATION; ARTICLE; CATALYST; CHEMICAL MODIFICATION; LIQUID; PACKED BED REACTOR; PRESSURE; SOLUBILITY; STEADY STATE; SUPERCRITICAL FLUID; TEMPERATURE DEPENDENCE; VELOCITY;

EID: 0037414134     PISSN: 08885885     EISSN: None     Source Type: Journal    
DOI: 10.1021/ie0206305     Document Type: Article

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