Effects of the oxide layer formed on TiN coated silicon wafer on the friction and wear characteristics in dry sliding

Surface and Coatings Technology

Volumn 168, Issue 1, 2003, Pages 84-90

  Cho, Chung Woo ^a   Lee, Young Ze ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Atomic force microscopy; Auger electron analysis; Oxide layer; Sliding test; TiN coated silicon wafer; X ray diffraction analysis

Indexed keywords

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; COATINGS; FRICTION; OXIDATION; SCANNING ELECTRON MICROSCOPY; TITANIUM NITRIDE; WEAR OF MATERIALS; X RAY DIFFRACTION;

COATED DISK SPECIMENS;

SILICON WAFERS;

COATING; DRY SLIDING; FRICTION; OXIDATION; TITANIUM NITRIDE; WEAR; WEAR RESISTANCE;

EID: 0037403679     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00864-2     Document Type: Article

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