The dielectric properties of pulsed laser deposited SrTiO3 thin films

Microelectronic Engineering

Volumn 66, Issue 1-4, 2003, Pages 891-895

  He, S M ^a   Li, D H ^a   Deng, X W ^a   Liu, X Z ^a   Zhang, Y ^a   Li, Y R ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

Dielectric; Leakage current; PLD; STO; Thin films

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC FIELDS; LEAKAGE CURRENTS; PULSED LASER DEPOSITION; STRONTIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

DIELECTRIC DISSIPATION;

THIN FILMS;

EID: 0037393716     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)01017-1     Document Type: Conference Paper

References (5)

1. Ang C., Cross L.E., Yu Z., Guo R., Bhalla A.S. Appl. Phys. Lett. 78:2001;2754.
2. Ang C., Yu Z., Cross L.E., Guo R., Bhalla A.S. Appl. Phys. Lett. 79:2001;818.
3. Morito K., Suzuki T., Sekiguchi S., Okushi H., Fujimoto M. Jpn. J. Appl. Phys. 39:2000;166.
4. Jeon Y.-Ah, Choi E.-S., Seo T.-S., Yoon S.-G. Appl. Phys. Lett. 79:2001;1012.
5. Vendik O.G., Hollmann E.K., Kozyrev A.B., Prudan A.M. J. Superconductivity. 12:1999;325.