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Current Applied Physics

Volumn 3, Issue 2-3, 2003, Pages 269-274

Effect of the oxidation process on the luminescence of HF-treated porous silicon

(3) Sharma, S N a Banerjee, R a Barua, A K a

a DEPARTMENT OF MATERIALS SCIENCE (India)

Author keywords

Current density; HF treatment; Oxidation; Photoluminescence; Porous silicon; Surface passivation

Indexed keywords

EID: 0037376050 PISSN: 15671739 EISSN: None Source Type: Journal
DOI: 10.1016/S1567-1739(02)00214-6 Document Type: Article

Times cited : (7)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.