Atomistic study of ion-beam deposition conditions for hard amorphous carbon

Computational Materials Science

Volumn 27, Issue 1-2, 2003, Pages 16-22

  Belov, A Yu ^a,b   Jager H U ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b SHUBNIKOV INSTITUTE OF CRYSTALLOGRAPHY   (Russian Federation)

Author keywords

Intrinsic stress; Ion beam deposition; Molecular dynamics; Tetrahedral amorphous carbon

Indexed keywords

AMORPHOUS FILMS; COMPRESSIVE STRESS; COMPUTER SIMULATION; DIAMOND LIKE CARBON FILMS; MOLECULAR DYNAMICS; RELAXATION PROCESSES;

ION ENERGIES;

ION BEAM ASSISTED DEPOSITION;

EID: 0037373546     PISSN: 09270256     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0256(02)00419-6     Document Type: Conference Paper

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