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Applied Physics A: Materials Science and Processing

Volumn 76, Issue 5, 2003, Pages 755-761

In situ observation of dynamics of plasma self-channeling and bulk modification in silica glasses induced by a high-intensity femtosecond laser

(3) Cho, S H a Kumagai, H a Midorikawa, K a

a INST OF PHYS AND CHEMICAL RESEARCH (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MODIFICATION; ELECTRON SPIN RESONANCE SPECTROSCOPY; LASER BEAM EFFECTS; LASER PULSES; OPTICAL VARIABLES MEASUREMENT; OPTICAL WAVEGUIDES; PHASE TRANSITIONS; PLASMA APPLICATIONS; REFRACTIVE INDEX; ULTRAFAST PHENOMENA;

DEFECT CONCENTRATION; HIGH INTENSITY FEMTOSECOND LASERS; OPTICAL CRACK MODIFICATION; PLASMA SELF-CHANNELING; STRUCTURAL TRANSITIONS;

FUSED SILICA;

EID: 0037356237 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-002-1470-0 Document Type: Article

Times cited : (22)

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