Nano-patterning photosensitive polymers using local field enhancement at the end of apertureless SNOM tips

Journal of Microscopy

Volumn 209, Issue 3, 2003, Pages 214-222

  H'Dhili, F ^a   Bachelot, R ^a   Rumyantseva, A ^a   Lerondel, G ^a   Royer, P ^a  

^a UNIVERSITÉ DE TECHNOLOGIE DE TROYES   (France)

Author keywords

Apertureless SNOM; Field enhancement; Nanostructures; Optical lithography; PMMA DR1 polymer

Indexed keywords

ATOMIC FORCE MICROSCOPY; FINITE DIFFERENCE TIME DOMAIN METHOD; IMAGE ENHANCEMENT; LIGHT SENSITIVE MATERIALS; LIGHT SOURCES; NUMERICAL METHODS; PHOTOLITHOGRAPHY; PHOTOSENSITIVITY;

APERTURELESS SNOM; FIELD ENHANCEMENT; INTENSITY DISTRIBUTION; LOCAL FIELD ENHANCEMENT; NANOMETRES; NANOPATTERNING; NEAR FIELDS; OPTICAL FIELD ENHANCEMENT; PHOTOSENSITIVE POLYMERS; PMMA-DR1 POLYMER;

INCIDENT LIGHT;

POLYMER;

ANALYTICAL PARAMETERS; ARTICLE; ATOMIC FORCE MICROSCOPY; CALCULATION; GEOMETRY; INCIDENCE; LIGHT; POLARIZATION; PRIORITY JOURNAL; SCANNING NEAR FIELD OPTICAL MICROSCOPY; SURFACE PROPERTY; TIME;

EID: 0037354712     PISSN: 00222720     EISSN: None     Source Type: Journal    
DOI: 10.1046/j.1365-2818.2003.01123.x     Document Type: Article

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