Influence of substrate temperature on the chemical and microstructural properties of MO-CVD ZrTiO4 thin films

Applied Physics A: Materials Science and Processing

Volumn 76, Issue 5, 2003, Pages 801-808

  Padeletti, G ^a   Cusma A ^a,b   Ingo, G M ^a   Santoni, A ^c   Loreti, S ^c   Minarini, C ^e   Viticoli, M ^a,d  

^a CNR   (Italy)

^b UNIVERSITY OF ROME TOR VERGATA   (Italy)

^c ENEA   (Italy)

^d UNIVERSITY OF CATANIA   (Italy)

^e ENEA CR Portici   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; CRACK PROPAGATION; CRYSTALLOGRAPHY; MAGNETRON SPUTTERING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PERMITTIVITY; PULSED LASER DEPOSITION; RESIDUAL STRESSES; SILICA; SYNTHESIS (CHEMICAL); THERMAL EFFECTS; ULTRATHIN FILMS;

MICRODEVICES; ZIRCONIUM TITANATE;

ZIRCONIUM COMPOUNDS;

EID: 0037354257     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-002-1663-6     Document Type: Article

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