Optical and electrical characterization of plasma polymerized pyrrole films

Journal of Applied Physics

Volumn 93, Issue 5, 2003, Pages 2705-2711

  Sakthi Kumar, D ^a   Nakamura, Kenji ^a   Nishiyama, Satoko ^a   Ishii, Shigeru ^a   Noguchi, Hiromichi ^a   Kashiwagi, Kunihiro ^a   Yoshida, Yasuhiko ^a  

^a TOYO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; BANDWIDTH; CHARACTERIZATION; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CONDUCTIVITY; INFRARED SPECTROSCOPY; IODINE; MORPHOLOGY; PLASMA POLYMERIZATION; SCANNING ELECTRON MICROSCOPY;

PYRROLE FILMS;

PLASTIC FILMS;

EID: 0037351433     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1542692     Document Type: Article

References (50)

1. H. Yasuda, Plasma Polymerization (Academic, New York, 1985).
2. N. Hozumi, T. Takao, Y. Kasama, and Y. Ohki, Jpn. J. Appl. Phys., Part 1 22, 636 (1983).
3. R. W. Bieg and K. B. Wischmann, Sol. Energy Mater. 3, 301 (1980).
4. L. S. Polak and Y. A. Lebedev, Plasma Chemistry (Cambridge International Science Publishing, Cambridge, 1998).
5. H. Biderman and D. Slavinska, Surf. Coat. Technol. 125, 371 (2000).
6. A. K. Rulson, J. A. Tobin, S. S. Bajiki, and D. D. Dentas, Sens. Actuators B 22, 134 (1994).
7. N. Inagaki and J. Ohkubo, J. Appl. Polym. Sci. 43, 793 (1991).
8. H. Shirakawa, E. J. Louis, A. G. MacDiarmid, C. K. Chiang, and A. J. Heeger, J.C.S. Chem. Commun. 578, (1977).
9. R. Qian, J. Qiu, and D. Shen, Synth. Met. 18, 13 (1987).
10. T. Shimidzu, A. Ohtani, T. Iyoda, and K. Honda, J. Electroanal. Chem. 224, 123 (1987).
11. D. Macinnes, Jr. and B. L. Funt, Synth. Met. 25, 235 (1988).
12. K. M. Choi, K. H. Kim, and J. S. Choi, J. Phys. Chem. Solids 50, 283 (1989).
13. D. Belanger, J. Nadreau, and G. Fortier, J. Electroanal. Chem. 274, 143 (1989).
14. M. V. Deshpande and E. A. H. Hall, Biosens. Bioelectron. 5, 431 (1990).
15. W. Schuhmann. Sens. Actuators B 4, 41 (1991).
16. R. Sing, R. P. Tandon, V. S. Panwar, and S. Chandra, J. Appl. Phys. 69, 2504 (1991).
17. C. G. J. Koopal, M. C. Feiters, R. J. M. Nolte, B. de Ruiter, R. B. M. Schastroot, R. Czajka, and H. V. Kempen, Synth. Met. 51, 397 (1992).
18. V. Misoska, Mis. J. Ding, J. M. Davey, W. E. Price, S. F. Ralph, and G. G. Wallace, Polymer 42, 8571 (2001).
19. S. Reiter, K. Habermuller, and W. Schuhmann, Sens. Actuators B 79, 150 (2001).
20. T. Kojima, H. Takaku, Y. Urata, and K. Gotoh, J. Appl. Polym. Sci. 48, 1395 (1993).
21. W. J. V. Ooij, S. Eufinger, and T. H. Ridgway, Plasmas Polymers 1, 229 (1996).
22. S. Euflnger, W. J. V. Ooij, and T. H. Ridgway, J. Appl. Polym. Sci. 61, 3247 (1996).
23. J. Zhang, M. Z. Wu, T. S. Pu, Z. Y. Zhang, R. P. Jin, Z. S. Tong, D. Z. Zhu, D. X. Cao, F. Y. Zhu, and J. Q. Cao, Thin Solid Films 307, 14 (1997).
24. G. J. Cruz, J. Morales, and R. Olayo, Thin Solid Films 342, 119 (1999).
25. J. Morales, M. G. Olayo, G. J. Cruz, M. M. Castillo-Ortega, and R. Olayo, J. Polym. Sci., Part B: Polym. Phys. 38, 3247 (2000).
26. Y. Iriyama and M. Hanawa, Polym. J. (Tokyo) 33, 419 (2001).
27. N. V. Bhat and N. V. Joshi, Plasma Chem. Plasma Process. 14, 151 (1994).
28. R. C. Lord, Jr. and F. A. Miller, J. Chem. Phys. 10, 328 (1942).
29. F. Fally, C. Doneux, J. Riga, and J. J. Verbist, J. Appl. Polym. Sci. 56, 597 (1995).
30. S. F. Durrant, N. Marcal, M. A. Bica de Moraes, J. H. Nicola, S. G. Castro, and R. C. G. Vinhas, Thin Solid Films 259, 139 (1995).
31. B. Colthup and L. H. Daly, Introduction to IR and Roman Spectroscopy (Academic, New York, 1964).
32. L. J. Bellamy, The Infrared Spectra of Complex Molecules, 2nd ed. (Wiley, New York, 1958), p. 378.
33. Y. Osada, Q. S. Yu, H. Yasunaga, Y. Kagami, F. S. Wang, and J. Chen, J. Polym. Sci., Part A: Polym. Chem. 27, 3799 (1989).
34. N. Inagaki, Plasma Surface Modification and Plasma Polymerization (Technomic, Lancaster, 1996).
35. X. Zhang, C. H. Kam, Y. Zhou, X. Q. Han, Y. L. Lam, Y. C. Chan, and K. Pita, Mater. Chem. Phys. 63, 174 (2000), and references therein.
36. L. Cheriyan and P. Radhakrishnan, Curr. Sci. 62, 423 (1992).
37. H. Laurs and G. Heiland, Thin Solid Films 149, 129 (1987).
38. N. Kashiwasaki, Jpn. J. Appl. Phys., Part 1 31, 1892 (1992).
39. J. G. Simmons, in Handbook of Thin Film Technology, edited by L. I. Maissel and R. Glang (McGraw-Hill, New York, 1970), Chap. 14.
40. S. M. Sze, Physics of Semiconductor Devices, 2nd ed. (Wiley, New York, 1981), p. 403.
41. M. A. Lampert, Phys. Rev. 103, 1648 (1956).
42. B. Thomas, M. G. Krishna Pillai, and S. Jayalekshmi, J. Phys. D 21, 503 (1988).
43. J. Tyczkowski, M. Zieliński, and M. Kryszewski, Thin Solid Films 55, 253 (1978).
44. K. L. Chopra, Thin Film Phenomena (McGraw-Hill, New York, 1969), p. 500.
45. C. A. Mead, Phys. Rev. 128, 2088 (1962).
46. D. Sakthi Kumar, J. Mater. Sci. 35, 4427 (2000).
47. A. Goswami, Thin Film Fundamentals (New Age International, New Delhi, 1996), p. 412.
48. J. C. Manifacier, J. Gasiot, and J. P. Fillard, J. Phys. E 9, 1002 (1976).
49. D. M. Hughes and M. W. Jones, J. Phys. D 7, 2081 (1974).
50. T. Mizutani, Y. Takai, T. Osawa, and M. Ieda, J. Phys. D 9, 2253 (1976).