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Volumn 46, Issue 3, 2003, Pages 57-60
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A new generation of CVS monitors Cu damascene plating baths
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Author keywords
[No Author keywords available]
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Indexed keywords
COPPER PLATING;
CYCLIC VOLTAMMETRY;
DUCTILITY;
ELECTROLYTES;
ELECTROPLATING;
HARDNESS;
INTEGRATED CIRCUITS;
MASS TRANSFER;
TENSILE STRENGTH;
CYCLIC VOLTAMMETRIC STRIPPING (CVS);
SEMICONDUCTOR DEVICE MANUFACTURE;
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EID: 0037348066
PISSN: 0038111X
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Review |
Times cited : (3)
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References (1)
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