Plasma deposition of boron films with high growth rate and efficiency using carborane

Journal of Nuclear Materials

Volumn 313-316, Issue SUPPL., 2003, Pages 214-218

  Buzhinskij, O I ^a   Otroshchenko, V G ^a   Whyte, D G ^b   Baldwin, M ^b   Conn, R W ^b   Doerner, R P ^b   Seraydarian, R ^b   Luckhardt, S ^b   Kugel, H ^c   West, W P ^d  

^a TROITSK INSTITUTE FOR INNOVATION AND FUSION RESEARCH   (Russian Federation)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c PRINCETON PLASMA PHYSICS LABORATORY   (United States)

^d GENERAL ATOMICS   (United States)

Author keywords

Boron films; Carborane; High growth; Plasma; Plasma wall interaction; Tokamak

Indexed keywords

CARBON; EROSION; FILM GROWTH; FUSION REACTOR DIVERTORS; GLOW DISCHARGES; PLASMA CONFINEMENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA INTERACTIONS; TOKAMAK DEVICES;

BORONIZATION; MAGNETIC CONFINEMENT;

BORON;

EID: 0037345070     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3115(02)01482-4     Document Type: Conference Paper

References (4)

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