Helium depth profiling in tantalum after ion implantation and high-temperature annealing

Journal of Nuclear Materials

Volumn 312, Issue 2-3, 2003, Pages 141-145

  Zielinski, F ^a   Costantini, J M ^b   Haussy, J ^a   Durbin, F ^a  

^a CEA DIF   (France)

^b SRMA   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; ANNEALING; HIGH TEMPERATURE EFFECTS; ION IMPLANTATION; TANTALUM;

HIGH-TEMPERATURE ANNEALING;

HELIUM;

EID: 0037323119     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3115(02)01589-1     Document Type: Article

References (20)

1. Ullmaier H. Nucl. Fusion. 24:1984;1039.
2. Paszti F. Nucl. Instrum. and Meth. B. 66:1992;83.
3. Moncoffre N., Barbier G., Leblond E., Martin Ph., Jaffrezic H. Nucl. Instrum. and Meth. B. 140:1998;402.
4. Mayer J.W., Rimini E. Ion Beam Handbook for Material Analysis. 1977;Academic, New York.
5. Amsel G., Lanford W.A. Annu. Rev. Nucl. Part. Sci. 34:1984;435.
6. Lewis M.B., Farrell K. Nucl. Instrum. and Meth. B. 16:1986;163.
7. Lewis M.B. J. Nucl. Mater. 148:1987;175.
8. Roth J., Picraux S.T., Eckstein W., Bøttiger J., Berisch R. J. Nucl. Mater. 63:1976;120.
9. von den Driesch H.J., Jung P. High Temp.-High Pressures. 12:1980;635.
10. Sciani V., Jung P. Radiat. Eff. 78:1983;87.
11. Jung P., Schroeder K. J. Nucl. Mater. 155-157:1988;1137.
12. Glyde H.R., Mayne K.I. Philos. Mag. 12:1965;997.
13. Edwards D. Jr., Kornelsen E.V. Surf. Sci. 44:1974;1.
14. Philipps V., Sonnenberg K., Williams J.M. J. Nucl. Mater. 107:1982;271.
15. J.P. Biersack, L.G. Haggmark, Nucl. Instrum. and Meth., 174 (1980) 257. Available from http://www.srim.org.
16. O. Bersillon, private communication.
17. Ryssel H., Ruge I. Ion Implantation. 1986;Wiley, Chichester.
18. J. Philibert, Diffusion and Matter Transport in Solids, Ed de Physique, Paris, 1985.
19. Costantini J.M., Trocellier P., Haussy J., Grob J.J. Nucl. Instrum. and Meth. B. 195:2002;400.
20. G. Grübel, PhD thesis, Konstanz, 1987.