Reactions of cis-2,3-dimethylaziridine, 3-pyrroline and pyrrolidine with Me3Al and Me3Ga: Adducts and dimeric amides

European Journal of Inorganic Chemistry

Volumn , Issue 4, 2003, Pages 656-665

  Zhang, Yuankui ^a,b   Budzelaar, Peter H M ^a   Smits, Jan M M ^a   De Gelder, René ^a   Hageman, Paul R ^a   Gal, Anton W ^a  

^a RADBOUD UNIVERSITY NIJMEGEN   (Netherlands)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Aluminium; Chemical vapour deposition; Gallium; Nitrides

Indexed keywords

ALUMINUM; AMIDES; BOND LENGTH; DIMERS; GALLIUM NITRIDE; III-V SEMICONDUCTORS; X RAY CRYSTALLOGRAPHY;

AZIRIDINES; CHEMICAL VAPOUR DEPOSITION; CIS-TRANS; HIGHEST TEMPERATURE; MONOMERICS; PYRROLIDINE DERIVATIVES; PYRROLIDINES; PYRROLINES; SPECTROSCOPIC DATA; X-RAY STRUCTURE;

CHEMICAL VAPOR DEPOSITION;

1,3,5 TRIMETHYLBENZENE; 2,3 DIMETHYLAZIRIDINE; ALUMINUM; AMIDE; AZIRIDINE DERIVATIVE; DIMER; GALLIUM; METHANE; PYRROLIDINE DERIVATIVE; PYRROLINE DERIVATIVE; UNCLASSIFIED DRUG;

ARTICLE; CALCULATION; CHEMICAL BOND; CHEMICAL REACTION; CRYSTAL STRUCTURE; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; ROOM TEMPERATURE; X RAY CRYSTALLOGRAPHY;

EID: 0037294035     PISSN: 14341948     EISSN: None     Source Type: Journal    
DOI: 10.1002/ejic.200390091     Document Type: Article

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