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Journal of Crystal Growth

Volumn 248, Issue SUPPL., 2003, Pages 229-234

Advanced process control for high quality R & D and production of MOVPE material by RealTemp™

(6) Malm, Hedda a Asplund, C b Becanovic, S a Borglind, J a Parekh, A c Hirschauer, B a

a ACREO AB (Sweden)

b ROYAL INSTITUTE OF TECHNOLOGY (Sweden)

c EMCORE CORPORATION (United States)

Author keywords

A1. Emissivity compensated pyrometry; A1. RealTemp ; A1. Uniformity; A3. Metalorganic vapor phase epitaxy; A3. Multi quantum wells; B1. AlGaAs

Indexed keywords

INFRARED DEVICES; METALLORGANIC VAPOR PHASE EPITAXY; PHOTODETECTORS; PROCESS CONTROL; RESEARCH AND DEVELOPMENT MANAGEMENT; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE;

INFRARED PHOTODETECTOR ARRAYS;

SEMICONDUCTOR QUANTUM WELLS;

EID: 0037291341 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-0248(02)01849-3 Document Type: Conference Paper

Times cited : (4)

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