Diffusion of Ta in α-Ti

Applied Physics A: Materials Science and Processing

Volumn 76, Issue 2, 2003, Pages 247-250

  Perez R A ^a,c   Dyment, F ^a,c   GarciA Bermudez G ^a,c   Abriola, D ^a   Behar, M ^b  

^a DEPARTAMENTO DE FÍSICA   (Argentina)

^b FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^c Facultad de Ciencias Naturales e Instituto M Lillo   (Argentina)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DIFFUSION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS; TITANIUM;

PENETRATION PROFILES;

TANTALUM;

EID: 0037290860     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390201422     Document Type: Article

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