Fabrication of poly-Si TFT's on glass with a novel method of back-reflecting low-temperature UV-assisted nickel-induced crystallization

Solid-State Electronics

Volumn 47, Issue 2, 2003, Pages 361-366

  Rezaee, Leila ^a   Mohajerzadeh, Shamsoddin ^a   Khakifirooz, Ali ^a  

^a UNIVERSITY OF TEHRAN   (Iran)

Author keywords

Amorphous silicon; Lateral crystallization; Metal induced crystallization; Polysilicon; Thin film transistor

Indexed keywords

AMORPHOUS SILICON; CRYSTALLIZATION; CRYSTALLOGRAPHY; GLASS; NICKEL; NUCLEATION; OPTICAL MICROSCOPY; SCANNING ELECTRON MICROSCOPY; THIN FILM TRANSISTORS; ULTRAVIOLET RADIATION; X RAY DIFFRACTION ANALYSIS;

POLYSILICON FILMS;

POLYSILICON;

EID: 0037290370     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(02)00221-6     Document Type: Conference Paper

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