High-aspect-ratio microstructures fabricated by X-ray lithography of polymethylsilsesquioxane-based spin-on glass thick films

Microsystem Technologies

Volumn 9, Issue 3, 2003, Pages 171-175

  Liu, Y ^a   Cui, T ^a   Coane, P J ^a   Vasile, M J ^a   Goettert, J ^b  

^a LOUISIANA TECH UNIVERSITY   (United States)

^b LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; CROSSLINKING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLASS; LOW TEMPERATURE OPERATIONS; ORGANIC SOLVENTS; SOL-GELS; SURFACE PROPERTIES; THICK FILMS; X RAY LITHOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY;

HIGH ASPECT RATIO MICROSTRUCTURES; POLYMETHYLSILSESQUIOXANE-BASED SPIN-ON GLASS THICK FILMS; SURFACE QUALITY BY ROUGHNESS TESTING SYSTEM;

MICROSTRUCTURE;

EID: 0037281890     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-002-0222-6     Document Type: Article

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