Tribological properties of nitrogen-containing amorphous carbon film produced by dc plasma chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 1, 2003, Pages 6-13

  Zhang, Wei ^a   Wazumi, Koichiro ^a   Tanaka, Akihiro ^a   Koga, Yoshinori ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL BONDS; COMPOSITION EFFECTS; ELECTRIC POTENTIAL; FRICTION; HYDROGEN; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STRAIN; TRIBOLOGY; VACUUM APPLICATIONS; WEAR RESISTANCE;

BIAS VOLTAGE; FRICTION TESTER; VACUUM ENVIRONMENT;

CARBON;

EID: 0037277281     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1521966     Document Type: Article

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