UV-Induced formation of [Fe(bpy)3]2+ complex and its confinement into silica fine particles

Journal of Sol-Gel Science and Technology

Volumn 26, Issue 1-3, 2003, Pages 103-106

  Nakanishi, Chikashi ^a   Ikeda, Saori ^a   Isobe, Tetsuhiko ^a   Senna, Mamoru ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

Complex formation; Photo sensitivity; Reverse micelle method; Silica fine particles

Indexed keywords

HYDROCHLORIC ACID; PHOTOSENSITIVITY; SILICA; SOLUTIONS; SURFACE ACTIVE AGENTS; ULTRAVIOLET RADIATION;

REVERSE MICELLE METHOD;

COMPLEXATION;

EID: 0037268908     PISSN: 09280707     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1020749604691     Document Type: Conference Paper

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