Silica sulfuric acid/NaNO2 as a novel heterogeneous system for the oxidation of urazoles under mild conditions

Synthetic Communications

Volumn 33, Issue 5, 2003, Pages 833-841

  Zolfigol, Mohammad Ali ^a   Chehardoli, Gholamabbas ^a   Mallakpour, Shadpour E ^b  

^a BU ALI SINA UNIVERSITY   (Iran)

^b ISFAHAN UNIVERSITY OF TECHNOLOGY   (Iran)

Author keywords

Heterogeneous conditions; Oxidation; Silica sulfuric acid; Triazolinediones; Urazoles

Indexed keywords

CHLOROSULFONIC ACID; DICHLOROMETHANE; SILICON DIOXIDE; SODIUM NITRITE; SULFONIC ACID DERIVATIVE; SULFURIC ACID; TRIAZOLINE DERIVATIVE; UNCLASSIFIED DRUG;

ARTICLE; COVALENT BOND; OXIDATION; ROOM TEMPERATURE; SYNTHESIS;

EID: 0037248771     PISSN: 00397911     EISSN: None     Source Type: Journal    
DOI: 10.1081/SCC-120016329     Document Type: Article

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53. 2, some of the TADs are removed with the solvent. Therefore, the temperature must be controlled and dichloromethane is the best solvent for this purpose.