Electromigration in integrated circuit interconnects studied by X-ray microscopy

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 199, Issue , 2003, Pages 469-474

  Schneider, G ^a   Denbeaux, G ^a   Anderson, E ^a   Bates, W ^a   Salmassi, F ^a   Nachimuthu, P ^a   Pearson, A ^a   Richardson, D ^a   Hambach, D ^b   Hoffmann, N ^c   Hasse, W ^c   Hoffmann, K ^d  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF GÖTTINGEN   (Germany)

^c LEIBNIZ UNIVERSITY HANNOVER   (Germany)

^d Micronas GmbH Freiburg   (Germany)

Author keywords

Electromigration; Interconnects; X ray imaging; Zone plates

Indexed keywords

CURRENT DENSITY; DIELECTRIC DEVICES; ELECTROMIGRATION; MULTILAYERS; PHOTONS; X RAY MICROSCOPES;

ZONE PLATES;

INTEGRATED CIRCUITS;

EID: 0037244304     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)01565-3     Document Type: Conference Paper

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