The effect of stoichiometry on the stability of steps on TiO 2 (1 1 0)

Applied Surface Science

Volumn 201, Issue 1-4, 2002, Pages 161-170

  Jak, M J J ^a   Van Kreuningen, A ^a   Verhoeven, J ^a   Frenken, J W M ^b  

^a FOM INSTITUTE AMOLF   (Netherlands)

^b LEIDEN UNIVERSITY   (Netherlands)

Author keywords

Atomic force microscopy; Titanium oxide

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; OXYGEN; PARTIAL PRESSURE; STOICHIOMETRY; THERMAL EFFECTS; TITANIUM DIOXIDE;

PARTIAL OXYGEN PRESSURE;

SURFACE PHENOMENA;

EID: 0037202627     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00844-9     Document Type: Article

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